Defects and amorphization in ion-implanted silicon

Gyulai József and Révész P. and Zsoldos Lehel and Vértesi G. and Gyimesi J.: Defects and amorphization in ion-implanted silicon. In: Acta physica et chemica, (20) 3. pp. 259-266. (1974)

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Item Type: Article
Journal or Publication Title: Acta physica et chemica
Date: 1974
Volume: 20
Number: 3
ISSN: 0001-6721
Page Range: pp. 259-266
Language: English
Related URLs: http://acta.bibl.u-szeged.hu/39337/
Uncontrolled Keywords: Természettudomány, Kémia, Fizika
Additional Information: Bibliogr.: 266. p.; Ismertetett mű: J. D'ûlai-P. Reves-L. Žoldoš-G. Verteši-J. D'imeši: Defekty i amorfizaciâ v ionno legirovammon kremnii
Date Deposited: 2016. Oct. 17. 09:26
Last Modified: 2021. Jun. 01. 15:11
URI: http://acta.bibl.u-szeged.hu/id/eprint/23914

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