Inhomogenity of the 172 nm VUV light irradiated aqueous solutions

Farkas, Luca and Peintler, Gábor and Oppenländer, Thomas and Alapi, Tünde: Inhomogenity of the 172 nm VUV light irradiated aqueous solutions. Proceedings of the International Symposium on Analytical and Environmental Problems, (24). pp. 416-420. (2018)

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Abstract

Vacuum ultraviolet (VUV) photolysis is one of the Advanced Oxidation Processes (AOPs) for the elimination of trace pollutants from water and air. The ultraviolet (UV) radiation below 200 nm is named VUV, because it is strongly absorbed by air. Using VUV photolysis reactive species (H and OH) can be generated directly from water without addition of any chemicals. Consequently VUV radiation is used for producing ultrapure water and often investigated as a possible method for elimination of organic pollutants from water. In the case of VUV photolysis low pressure mercury vapor lamp (emits both 254 nm UV and 185 nm VUV photons) or Xe excimer lamp (emits both 172 nm VUV photons) can be applied as light source. In latter case the absorption coefficient of water at 172 nm is 550 cm–1 . Consequently, the penetration depth of VUV radiation is very small, only 0.04 mm. In this work we have investigated the effect of inhomogenity caused within this very thin VUV irradiated layer on the concentration of the primary formed reactive species, such as H and OH, using model calculation.

Item Type: Article
Journal or Publication Title: Proceedings of the International Symposium on Analytical and Environmental Problems
Date: 2018
Volume: 24
Page Range: pp. 416-420
ISBN: 978-963-306-623-2
Uncontrolled Keywords: Fizikai kémia
Additional Information: Bibliogr.: 420. p. ; összefoglalás angol nyelven
Date Deposited: 2019. Jan. 08. 14:50
Last Modified: 2019. Jan. 08. 14:50
URI: http://acta.bibl.u-szeged.hu/id/eprint/56387

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