Preparation of photocatalysts by atomic layer deposition

Ballai Gergő and Kedves Zsolt and Pap Zsolt and Sápi András and Kovačič Sebastijan and Kukovecz Ákos and Kónya Zoltán: Preparation of photocatalysts by atomic layer deposition.

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Abstract

The use of semiconductor-based photocatalysts (e.g. metal oxides) in sewage water treatment is expected to be of great interest despite its shortcomings [1]. High surface area organic semiconductor-based structures are promising alternatives for the photodegradation of various organic pollutants. In addition, these polymer structures could be great backbones to produce polymer/metal oxide composite photocatalysts by Atomic Layer Deposition (ALD).

Item Type: Conference or Workshop Item
Journal or Publication Title: Proceedings of the International Symposium on Analytical and Environmental Problems
Date: 2021
Volume: 27
ISBN: 978-963-306-835-9
Page Range: pp. 89-90
Language: English
Publisher: University of Szeged
Place of Publication: Szeged
Event Title: International Symposium on Analytical and Environmental Problems (27.) (2021) (Szeged)
Related URLs: http://acta.bibl.u-szeged.hu/75798/
Uncontrolled Keywords: Környezetkémia
Additional Information: Bibliogr.: 90. p. ; ill. ; összefoglalás angol nyelven
Subjects: 01. Natural sciences
01. Natural sciences > 01.04. Chemical sciences
Date Deposited: 2022. May. 26. 13:56
Last Modified: 2022. Aug. 08. 15:40
URI: http://acta.bibl.u-szeged.hu/id/eprint/75932

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